Thinfilm technology as a customer service

In-house thinfilm production

The modern production facilities for thinfilm components at Rohde & Schwarz are used to make all the substrates employed in our high-precision measuring instruments. Since 1990 all production operations have been performed in a 1000 m² clean room with separate zones for cleanroom classes from 10000 to 100. The production facilities include:

Pattern generator for the preparation of photomasks
Sputtering facility with four targets and evaporation system
Photolithography
Substrate processing: drilling laser, scribling laser and wafer saw
Gold electroplating and etching
Resistor trimming using YAG laser
Precise instruments for measuring line width and layer height
Scanning electron microscope

The capacity of our production facilities allows the manufacture of customized thinfilm products as a customer service.


		Key Facts In-house thinfilm production The modern production facilities for thinfilm components at Rohde & Schwarz are used to make all the substrates employed in our high-precision measuring instruments. Since 1990 all production operations have been performed in a 1000 m² clean room with separate zones for cleanroom classes from 10000 to 100. The production facilities include: Pattern generator for the preparation of photomasks Sputtering facility with four targets and evaporation system Photolithography Substrate processing: drilling laser, scribling laser and wafer saw Gold electroplating and etching Resistor trimming using YAG laser Precise instruments for measuring line width and layer height Scanning electron microscope The capacity of our production facilities allows the manufacture of customized thinfilm products as a customer service.


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